|
| XENON |
3d5/2 |
M4N45N45 |
A.P. |
Ref. |
| Xe (implanted in graphite) |
669.65 |
545.2 |
1214.85 |
79- 18 |
| Xe (implanted in Ag) |
669.6 |
|
|
74-1 |
| Xe(implanted in Au) |
668.9 |
|
|
74-1 |
| Xe(implanted in Cu) |
669.6 |
|
|
74-1 |
| Na4XeO6 |
674.1 |
541.4 |
1215.5 |
77-26 |
| Xe (g) |
676.4 |
532.7v |
1209.1 |
72-10 |
|
| |
|
| |
Notes
| S |
Number of independent studies (where this is greater than 1) |
| E |
Number of these rejected as unsound (mainly early measurements) before the remaining
ones were used to determine a mean value |
| A.P |
Auger parameter (calculated from the most intense photoelectron line and Auger line) |
| M.A.P. |
Modified Auger Parameter |
| v |
Referenced to the vacuum level (gases) |
| c |
Includes minor corrections in high binding energy lines using X-ray energy data from reference 67-1 |
| Refs. |
Reference in which the data was originally published. (See the references
section) |
|
| |
|
Last updated 24 February, 2001
| Compiled by |
and |
Christopher Walker
KLA-Tencor,
686 Stirling Road
Slough
Berks., UK |
Simon Morton
Advanced Light Source
Lawrence Berkeley Laboratory
Berkeley
CA 94720 |
| email chris.walker@physics.org |
email S.Morton@uksaf.org |
© UK Surface Analysis Forum 1998
|
|
