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"Multi-Technique Problem Solving in an Industrial Environment"

Shell, Thornton Laboratories, Chester- Wednesday 6th of January 1999

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Parallel Workshop Sessions

"Surface Analysis outside UHV?"

Leader:- Dr. J. F. Watts
Raporteur:- Michael Hill-King, Veeco Instruments Ltd

Surface analysis is essentially interested in four key areas:- 
 
Topographic
 
Elemental
  
Chemical
 
Structural
 

A diverse range of techniques exists for characterising the surface with respect to these four areas. The number of available techniques exceeds 80. Most of these techniques require the use of UHV. The workgroup unanimously agreed that the only area which can be fully investigated outside UHV is topographic. The other three areas present both challenges and obstacles for analysis outside UHV. The use of UHV presents several disadvantages.
 
UHV can damage some samples, e.g. electrochemical or biological samples.
 
QC requirements in production environments demand immediate measurements, without removing samples to a laboratory.
  
Particular environmental processes require in situ measurement e.g. electrode surface in electrolyte.
 
UHV takes time and involves cost.
 

However, several techniques do not require UHV. They can be performed at low vacuum, under atmospheric conditions or in aqueous solution. These techniques include:-
 
Atomic Absorption Spectroscopy
 
Scanning Probe Microscopy
  
Infra-Red Spectroscopy (FT-IR, ATR)
 
Mossbaur Spectroscopy
 
Raman Spectroscopy (especially Surface Enhanced Raman Spectroscopy)
 
Glow Discharge Optical Emission Spectroscopy and GD-MS
   
Some Synchrotron methods  
 
 Various XRD and XRF methods  
  
Surface Force apparatus
 
BET and similar methods
 

The key questions are: "What does one really want to measure/analyse/characterise?" and "What is the surface?" The answer to the second question could be from monolayers to tens of nanometers. The practicalities of the various available technologies have to be considered. Current developments are tending towards low vacuum rather than no vacuum. Important considerations include size of sample/instrument and safety, as not all available techniques may be hazard-free outside UHV enclosures. Analysis outside UHV leaves open the possibility of introducing contamination, and lowers the detection limit of the instrumentation.

In conclusion it was felt that the use of surface analysis techniques outside UHV presented a two-fold balance.

There are opportunities for surface analysis outside of UHV. SPMs and other instruments provide a wealth of topographical and other information. The challenge lies in integrating multi-function instruments to operate outside UHV to cover elemental, structural and chemical analysis.

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Last updated 24 February, 2001

Simon Morton
Advanced Light Source
Lawrence Berkeley Laboratory
Berkeley
CA 94720

Comments or enquiries to S.Morton@uksaf.org

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